Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 563: | Line 563: | ||
|rowspan="2"| 325 mJ/cm<sup>2</sup> | |rowspan="2"| 325 mJ/cm<sup>2</sup> | ||
| 1 | | 1 | ||
|rowspan="2"| 1 µm<br>Tested using dehydration reducing measures (design elongated +40mm in y) | |rowspan="2"| 1 µm<br>Tested using dehydration reducing measures<br>(design elongated +40mm in y). | ||
|rowspan="2"| | |rowspan="2"| | ||
PEB: 60s @ 110°C<br> | PEB: 60s @ 110°C<br> | ||