Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions

Revision as of 08:53, 14 November 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits No edit summary ← Older edit		Revision as of 09:44, 15 November 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Request for user exposure slot Newer edit →
Line 12:		Line 12:


	The request form [[:File:JEOL9500 request form.docx \|can be found here.]] Please send the request to ~~both thope~~@dtu.dk ~~and elelop~~@dtu.dk.		The request form [[:File:JEOL9500 request form.docx \|can be found here.]] Please send the request to [mailto:e-beam@nanolab.dtu.dk E-beam@nanolab.dtu.dk].