Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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After successful execution of '''SETWFR''' and '''CHIPAL''' the condition file can now be saved and the exposure job can be executed, just as in the case of an unaligned exposure. | After successful execution of '''SETWFR''' and '''CHIPAL''' the condition file can now be saved and the exposure job can be executed, just as in the case of an unaligned exposure. | ||
= | =Alignment troubleshooting= | ||
Alignment on the JEOL system can be tricky, in this section we will briefly try and explain the cause and remedy for the most common problems encountered during the alignment process or job execution. | Alignment on the JEOL system can be tricky, in this section we will briefly try and explain the cause and remedy for the most common problems encountered during the alignment process or job execution. | ||