Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
| Line 155: | Line 155: | ||
=Global alignment - SETWFR= | =Global alignment - SETWFR= | ||
The next step is to verify that it is possible to detect the P and Q marks, this is done with the '''SETWFR''' subprogram. Select it and edit the parameters. | The next step is to verify that it is possible to detect the P and Q marks, this is done with the '''SETWFR''' subprogram. Select it and edit the parameters. | ||
Set the '''Measurement mode''' to '''Auto'''. Make sure that '''Material type''' is set to '''Wafer'''. Set the '''Material size''' and '''Multi-piece window''' correctly to your exposure. In the '''Material center offset position''' fields enter the P mark offset as found from the prealigner. Enter the P and Q mark design coordinates in the last four fields. Based on the chosen window, the design coordinates and the prealigner offset, the system now knows where to look for the P mark. | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||