Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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==Optical pre-alignment== | ==Optical pre-alignment== | ||
The optical pre-aligner is used to measure the location of the P and Q marks of the substrate after loading it to a cassette. The optical pre-alignment procedure will output | The optical pre-aligner is used to measure the location of the P and Q marks of the substrate after loading it to a cassette. The optical pre-alignment procedure will output several useful numbers: | ||
*P mark stage coordinate | |||
*Q mark stage coordinate | |||
*P mark shift relative to the slot center | |||
*Substrate rotation | |||
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