Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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==Etching of nanostructures in silicon using the ICP Metal Etcher or DRIE Pegasus== | ==Etching of nanostructures in silicon using the ICP Metal Etcher or DRIE Pegasus== | ||
*[[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|The 180 nm zep resist profiles]] | |||
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