Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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[[Image:RTP reactor schematic.jpg|400px|thumb|Schematic representation of the RTP2 Jipelec reactor. Image: DTU Nanolab]][[Image:Platen with captions.png|400px|thumb|RTP2 Jipelec chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | [[Image:RTP reactor schematic.jpg|400px|thumb|Schematic representation of the RTP2 Jipelec reactor. Image: DTU Nanolab]][[Image:Platen with captions.png|400px|thumb|RTP2 Jipelec chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | ||
The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image | The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image on the right. | ||
[[Image:Jipelec lamps.jpg|400px|thumb|RTP2 Jipelec halogen lamps. Image: DTU Nanolab internal]] | [[Image:Jipelec lamps.jpg|400px|thumb|RTP2 Jipelec halogen lamps. Image: DTU Nanolab internal]] | ||