Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions
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The number of doses for dose testing is controlled by the parameter '''m''' while the increase in dose between doses is defined by '''modulation''', it is a percentwise change relative to the base dose. For instance, if one wants to do a dose test with 200 µC/cm<sup>2</sup> as base dose in steps of 10 µC/cm<sup>2</sup> one would set '''modulation = 5'''. | The number of doses for dose testing is controlled by the parameter '''m''' while the increase in dose between doses is defined by '''modulation''', it is a percentwise change relative to the base dose. For instance, if one wants to do a dose test with 200 µC/cm<sup>2</sup> as base dose in steps of 10 µC/cm<sup>2</sup> one would set '''modulation = 5'''. | ||
The output is a single JDI file containing all modulation tables named '''MODx''', where x is a running number from 1 to '''m'''. The array and reference to each modulation table can then be set up in the JDF file as seen below. | |||
<pre> | |||
JOB/W 'THOPE',4 | |||
PATH DRF5M | |||
ARRAY (-4000,5,2000)/(0,1,0) | |||
ASSIGN P(1) -> ((1,1),MOD1) | |||
ASSIGN P(1) -> ((2,1),MOD2) | |||
ASSIGN P(1) -> ((3,1),MOD3) | |||
ASSIGN P(1) -> ((4,1),MOD4) | |||
ASSIGN P(1) -> ((5,1),MOD5) | |||
AEND | |||
PEND | |||
LAYER 1 | |||
P(1) 'mypattern.v30' | |||
SPPRM 4.0,,,,1.0,1 | |||
STDCUR 2.0 ;nA | |||
@'thopeExpanded.jdi' | |||
END | |||
</pre> | |||