Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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===Profile, top view at tilted SEM images=== | ===Profile, top view at tilted SEM images=== | ||
<gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow=" | <gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="2" widths="400px" heights="300px"> | ||
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</gallery> | </gallery> | ||
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 100W, coil power:1200W" perrow="4" widths="400px" heights="300px"> | <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 100W, coil power:1200W, the mask is removed by plasma ashing on top view and tilted view" perrow="4" widths="400px" heights="300px"> | ||
File:C10184_07.jpg | File:C10184_07.jpg | ||
File:C010184top_01.jpg | |||
File:C010184top_04.jpg | File:C010184top_04.jpg | ||
File:C010184tilt30plasmaO2_02.jpg | File:C010184tilt30plasmaO2_02.jpg| tilt 30 degrees | ||
File:C010184tilt30plasmaO2_01.jpg| tilt 30 degrees | |||
File:C010184tilt30plasmaO2_01.jpg | File:C010184tilt20plasmaO2_07.jpg| tilt 20 degrees | ||
File:C010184tilt20plasmaO2_07.jpg | File:C010184tilt20plasmaO2_05.jpg| tilt 20 degrees | ||
File:C010184tilt20plasmaO2_05.jpg | |||
</gallery> | </gallery> | ||