Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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===Profile, top view at tilted SEM images=== | ===Profile, top view at tilted SEM images=== | ||
<gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow=" | <gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="4" widths="400px" heights="300px"> | ||
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</gallery> | </gallery> | ||
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch" perrow=" | <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch" perrow="4" widths="400px" heights="300px"> | ||
File:C10022_03__02.jpg | File:C10022_03__02.jpg | ||
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</gallery> | </gallery> | ||
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:225sccm, Pressure:3.35mTorr" perrow=" | <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:225sccm, Pressure:3.35mTorr" perrow="4" widths="400px" heights="300px"> | ||
File:C10082_07.jpg | File:C10082_07.jpg | ||