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Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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<pre>
<pre>
MAGAZIN    'FIRSTEBL'        The magazine name is FIRSTEBL; max. 9 capital letters
;SDF example
MAGAZIN    'DOSES'         


#8                           Cassette from auto stocker shelf 8 is used
#1                            
%4B                          4" wafer in position A is exposed
%4B                           
JDF    'myfirstebl',1        Layer block no. 1 of the jdf-file 'myfirstebl.jdf' is exposed   
JDF    'dosetest',1         
ACC 100                      Acceleration voltage of 100keV is used (can not be changed)
ACC 100                       
CALPRM '6na_ap5'              The condition file 6na_ap5 is used, i.e. exposure at 6 nA
CALPRM '6na_ap5'               
DEFMODE 2                    Both deflectors are used (default)
DEFMODE 2                     
RESIST 200                    A base dose of 200 µC/cm2 is used
RESIST 200                     
SHOT A,16                     Shot pitch is 16 units (of 0.25 nm), i.e. 4 nm
SHOT A,20                      
OFFSET(0,0)                  An offset of 0 µm is applied in both X and Y
OFFSET(0,0)                   
      
      
END 8                         After exposure, cassette 8 will be remain on the stage
END 1                          
</pre>
</pre>


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<pre>
<pre>
JOB/W    'FIRSTEBL',4                          4inch wafer
;Example JDF
JOB/W    'DOSES',4                           


PATH  DRF5M                                   
PATH  DRF5M                                  Cyclic calibration definition
   ARRAY      (50,10,50)/(50,1,0)               
   ARRAY      (50,10,50)/(50,1,0)              10-1 array around (50,50) with 50 µm pitch in x-axis
     ASSIGN P(1)->((1,1),SHOT1)                 
     ASSIGN P(1)->((1,1),SHOT1)                Pattern and modulation assignment to each array element
     ASSIGN P(1)->((2,1),SHOT2)
     ASSIGN P(1)->((2,1),SHOT2)
     ASSIGN P(1)->((3,1),SHOT3)
     ASSIGN P(1)->((3,1),SHOT3)
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PEND
PEND


LAYER  1                                      Definition of pseudo layer 1
LAYER  1                                       


P(1)  'dtu_logo_um.v30'                     Assignment of P(1) to V30 file
P(1)  'dtu_logo_um.v30'                    
SPPRM 4.0,,,,1.0,1                            Beam parameters
SPPRM 4.0,,,,1.0,1                             
STDCUR  2.2 ;nA                              Beam current + 10% overhead
STDCUR  6.6 ;nA                               


SHOT1: MODULAT (( 0,0))                      Dose modulation tables
SHOT1: MODULAT (( 0,0))                       
SHOT2: MODULAT (( 0,5))
SHOT2: MODULAT (( 0,5))
SHOT3: MODULAT (( 0,10))
SHOT3: MODULAT (( 0,10))
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