Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Line 94: Line 94:
|185
|185
|170
|170
|-
!60 nm
|256
|308
|181
|305
|229
|253
|191
|185
|-
!90 nm
|259
|335
|195
|342
|255
|251
|222
|253
|-
!120 nm
|277
|346
|203
|357
|262
|257
|221
|278
|-
!150 nm
|269
|341
|205
|369
|265
|262
|225
|280
|-
!30 nm
|79
|77
|74
|71
|82
|151
|93
|57
|-
!60 nm
|102
|103
|91
|102
|115
|169
|96
|62
|-
!90 nm
|104
|112
|98
|114
|128
|167
|111
|84
|-
!120 nm
|111
|115
|102
|119
|131
|171
|111
|93
|-
!150 nm
|108
|114
|103
|123
|133
|175
|113
|93
|-
|}
|}


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher"