Specific Process Knowledge/Thin film deposition: Difference between revisions
No edit summary |
|||
| Line 40: | Line 40: | ||
[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/> | [[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/> | ||
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/> | [[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/> | ||
[[/Deposition of Niobium Titanium Nitride| Niobium Titanium Nitride - "superconductor" | [[/Deposition of Niobium Titanium Nitride| Niobium Titanium Nitride]] - "superconductor"<br/> | ||
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/> | [[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/> | ||