Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
| Line 73: | Line 73: | ||
|120 | |120 | ||
|180 | |180 | ||
|- | |||
! Pressure (mtorr) | ! Pressure (mtorr) | ||
2 | |2 | ||
|2 | |||
|2 | |||
|2 | |||
|2 | |||
|2 | |||
|5 | |||
|10 | |||
|- | |||
|} | |} | ||
| Line 73: | Line 73: | ||
|120 | |120 | ||
|180 | |180 | ||
|- | |||
! Pressure (mtorr) | ! Pressure (mtorr) | ||
2 | |2 | ||
|2 | |||
|2 | |||
|2 | |||
|2 | |||
|2 | |||
|5 | |||
|10 | |||
|- | |||
|} | |} | ||