Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano3|Sinano3.0]] | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano3|Sinano3.0]] | ||
!Sinano3.1 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano31|Sinano3.1]] | ||
!Sinano3.2 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano32|Sinano3.2]] | ||
!Sinano3.3 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33|Sinano3.3]] | ||
!Sinano3.4 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano34|Sinano3.4]] | ||
!Sinano4.0 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano4|Sinano4.0]] | ||
!Sinano3.5 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano35|Sinano3.5]] | ||
!Sinano3.6 | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36|Sinano3.6]] | ||
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!Cl<sub>2</sub> (sccm) | !Cl<sub>2</sub> (sccm) | ||
Revision as of 10:09, 16 March 2011
This page is under construction
Etching of nanostructures in silicon using the ICP Metal Etcher
| Sinano3.0 | Sinano3.1 | Sinano3.2 | Sinano3.3 | Sinano3.4 | Sinano4.0 | Sinano3.5 | Sinano3.6 | |
|---|---|---|---|---|---|---|---|---|
| Cl2 (sccm) | 0 | 0 | 0 | 0 | 0 | 20 | 15 | 15 |
| BCl3 (sccm) | 5 | 3 | 5 | 5 | 5 | 0 | 5 | 5 |
| HBr (sccm) | 15 | 17 | 15 | 15 | 15 | 0 | 0 | 0 |
| Coil power (W) | 900 | 900 | 900 | 900 | 900 | 900 | 900 | 900 |
| Platen power (W) | 50 | 50 | 60 | 75 | 90 | 60 | 60 | 60 |
| Process time (s) | 150 | 180 | 120 | 180 | 120 | 90 | 120 | 180 |