Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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{| border="2" cellspacing="1" cellpadding="3" align="center"
{| border="2" cellspacing="1" cellpadding="3" align="center"
!
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!Sinano3.0
!
!Sinano3.1
!Sinano3.2
!Sinano3.3
!Sinano3.4
!Sinano4.0
!Sinano3.5
!Sinano3.6
|-
|-
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!Cl<sub>2</sub>
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|0
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|0
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|0
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|0
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|20
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|15
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|15
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Revision as of 10:52, 16 March 2011

This page is under construction

Etching of nanostructures in silicon using the ICP Metal Etcher

Sinano3.0 Sinano3.1 Sinano3.2 Sinano3.3 Sinano3.4 Sinano4.0 Sinano3.5 Sinano3.6
Cl2 0 0 0 0 0 20 15 15




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