Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles|user resist bottles in the cleanroom guide.]] | We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles|user resist bottles in the cleanroom guide.]] | ||
==DTU Nanolab supplied EBL resists== | |||
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Resist thickness as function of spin speed on Lab Spin 2/3 can be estimated from the parameters above as y = ax<sup>b</sup>, where y is resist thickness in nm and x is spin speed in RPM. | Resist thickness as function of spin speed on Lab Spin 2/3 can be estimated from the parameters above as y = ax<sup>b</sup>, where y is resist thickness in nm and x is spin speed in RPM. | ||
==User supplied resists== | |||
It is possible to obtain permission to user other resists at DTU Nanolab, users must however provide these resists and possibly developers themselves. A non-exhaustive list of user supplied EBL resist used at DTU Nanolab and some process guidelines can be found in the table below. | It is possible to obtain permission to user other resists at DTU Nanolab, users must however provide these resists and possibly developers themselves. A non-exhaustive list of user supplied EBL resist used at DTU Nanolab and some process guidelines can be found in the table below. | ||