Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Line 2: Line 2:


==Etching of nanostructures in silicon using the ICP Metal Etcher==
==Etching of nanostructures in silicon using the ICP Metal Etcher==
{| border="2" cellspacing="1" cellpadding="3" align="center"
!
!
!
|-
|
|
|
|-
|
|
|
|-
|
|
|
|-
|
|
|
|-
|
|
|
|-
|
|
|
|-
|}


*[[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano1|1 - the first nanoetch]]
*[[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano1|1 - the first nanoetch]]

Revision as of 10:44, 16 March 2011

This page is under construction

Etching of nanostructures in silicon using the ICP Metal Etcher




Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher&oldid=4771"