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Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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=Request for user exposure slot=
=Request for user exposure slot=
As of October 9th 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff in order to optimize the use of the system. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign the user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible.  
As of October 16th 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff in order to optimize the use of the system. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign the user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible.  




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