Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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After sample height verification follows a few aditional steps to verify the system can find the substrate alignment marks. | After sample height verification follows a few aditional steps to verify the system can find the substrate alignment marks. | ||
===Auto Gain Correction - AGCRG=== | |||
Alignment is done by scanning the beam over the alignment marks and recording the backscatter electron intensity. Thus, it is essential that the gain of the detector system is set to match the substrate material, the mark material and the beam current. | |||