Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/EBeamLithography/FirstEBL click here]''' | |||
Content and illustration by Thomas Pedersen, DTU Nanolab unless otherwise noted. | |||
=My first JEOL 9500 exposure tutorial= | =My first JEOL 9500 exposure tutorial= | ||
The JEOL 9500 E-beam writer offers world class performance, this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. This tutorial will demonstrate how to set up a simple dose test in an efficient manner. The complexity of this job is kept at a low level and we encourage new users to make sure their first job (first training session) matches this complexity level. More complex jobs can be run when a user is more familiar with the system. We will in particular request that users do '''not''' expect to do alignment during their first training session. | The JEOL 9500 E-beam writer offers world class performance, this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. This tutorial will demonstrate how to set up a simple dose test in an efficient manner. The complexity of this job is kept at a low level and we encourage new users to make sure their first job (first training session) matches this complexity level. More complex jobs can be run when a user is more familiar with the system. We will in particular request that users do '''not''' expect to do alignment during their first training session. | ||