Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
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*Previously there was a limit on the number of future bookings a user could have. There is no such defined limit any longer. We will of course not allow a single user to take up an unreasonable fraction of the time on the tool though. | *Previously there was a limit on the number of future bookings a user could have. There is no such defined limit any longer. We will of course not allow a single user to take up an unreasonable fraction of the time on the tool though. | ||
*Previously there was also a limit on the duration of a single session. Initially we will not impose a strict limit on this but during the request process we will work with the user to find a reasonable duration. | |||
*Long exposure will always be placed at the end of a day to free up day time for shorter exposures. | *Long exposure will always be placed at the end of a day to free up day time for shorter exposures. | ||