Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch: Difference between revisions
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</gallery> | </gallery> | ||
<gallery caption="EM tests with Cr mask on full wafer" perrow="3" widths="400px" heights="300px"> | <gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="3" widths="400px" heights="300px"> | ||
File:C09721_center_05.jpg | File:C09721_center_05.jpg | ||
File:C09721_center_07.jpg | File:C09721_center_07.jpg | ||