Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
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=Request for user exposure slot= | =Request for user exposure slot= | ||
As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign a user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible. | As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff in order to optimize the user of the system. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign a user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible. | ||