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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 648: Line 648:
! width="320" |
! width="320" |


|+'''Substrate view during backside alignment'''
|+'''Substrate view during backside alignment. Screenshots by Thomas Anhøj @ DTU Nanolab, 2019.'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:MLA150 BSA 2inch.JPG|300px]]
|[[Image:MLA150 BSA 2inch.JPG|300px]]
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