Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]] | [[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area. Data and graph by Thomas Anhøj @ DTU Nanolab, 2023.]] | ||
'''Speed vs. area:''' | '''Speed vs. area:''' | ||
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[[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The exposure speed was measured using a 10 mm x 100 mm exposure area, but should be approximately the same for a full 100 mm wafer exposure.]] | [[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The exposure speed was measured using a 10 mm x 100 mm exposure area, but should be approximately the same for a full 100 mm wafer exposure. Data and graph by Thomas Anhøj @ DTU Nanolab, 2023.]] | ||
'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||