Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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 (This section was updated 05-09-2023 by taran@nanolab)
-According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed of the machine for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 (2023-03-21) was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>.
+According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts the expected speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed of the machine for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 (2023-03-21) was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>.
 [[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]]