Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
| Line 274: | Line 274: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|AR-N 7520.18 | |||
| 1 L | |||
| 2016 | |||
| 0.7 | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|AR-N 8200.06 | |AR-N 8200.06 | ||
| 0.1 L | | 0.1 L | ||
| 2021 | | 2021 | ||
| 0.1 | | 0.1 | ||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|AR-N 8200.03 | |||
| 0.25 L | |||
| 2023 | |||
| 0.25 | |||
|} | |} | ||