Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 260: Line 260:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|AR-P 8200.06
|AR-N 7520.11 New
| 0.25 L
| 2024
| 0.25
 
|-
|-style="background:LightGrey; color:black"
|AR-N 7520.17 New
| 0.25 L
| 2026
| 0.25
 
|-
|-style="background:LightGrey; color:black"
|AR-N 7520.07 New
| 1 L
| 2018
| 0.8
 
|-
|-style="background:LightGrey; color:black"
|AR-N 7520.07 New
| 1 L
| 2018
| 0.8
 
|-
|-style="background:WhiteSmoke; color:black"
|AR-N 8200.06
| 0.1 L
| 0.1 L
| 2021
| 2021
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/EBLsubstratePrep"