Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4: Difference between revisions

Revision as of 10:28, 22 August 2023 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,317 edits →Process information ← Older edit		Revision as of 10:33, 22 August 2023 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,317 edits →Pegasus 4 - 150mm silicon oxide and silicon nitride etching Newer edit →
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	[[Image:Peg3and4 front 2.JPG \|frame\|~~left~~\|x300px\|The DRIE-Pegasus3 and DRIE-Pegasus4 operator station and cassette loading stations, {{photo1}}]]		[[Image:Peg3and4 front 2.JPG \|frame\|right\|x300px\|The DRIE-Pegasus3 and DRIE-Pegasus4 operator station and cassette loading stations, {{photo1}}]]

	'''The user manual and contact information can be found in LabManager:'''		'''The user manual and contact information can be found in LabManager:'''