Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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''Overlap Method:'' Allows one to setup a pattern overlap between main fields to mitigate stiching problems. The overlap dimension is controlled with the ''Size'' fields. The methods available are: | ''Overlap Method:'' Allows one to setup a pattern overlap between main fields to mitigate stiching problems. The overlap dimension is controlled with the ''Size'' fields. The methods available are: | ||
''Share between fields:'' This method divides pattern elements at main field boundaries and assigns the entire dose of an element to a single writing field. An overlap region can be defined such that small elements within this overlap are placed in a single writing field to avoid stitching. | *''Share between fields:'' This method divides pattern elements at main field boundaries and assigns the entire dose of an element to a single writing field. An overlap region can be defined such that small elements within this overlap are placed in a single writing field to avoid stitching. | ||
''Split Dose between Fields:'' | *''Split Dose between Fields:'' The dose is split evenly across neighbouring fields over the designated distance. | ||
''Interleaving:'' In this method an interleave is made between writing field boundaries over the distance set by ''Size''. The width of the interleaved strips is set in the ''Element Size Interleaving''. | *''Interleaving:'' In this method an interleave is made between writing field boundaries over the distance set by ''Size''. The width of the interleaved strips is set in the ''Element Size Interleaving''. | ||
''Interleaving + extra field:'' This method is somewhat similar to ''Interleave'' but in addition it creates an extra writing field with the interleaving part only. Thus, the interleaving part is written at 50% dose in each of the neighbouring fields and then written at 50% dose in a third (floating) writing field. | *''Interleaving + extra field:'' This method is somewhat similar to ''Interleave'' but in addition it creates an extra writing field with the interleaving part only. Thus, the interleaving part is written at 50% dose in each of the neighbouring fields and then written at 50% dose in a third (floating) writing field. | ||
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Illustration of ''Share between Fields'' overlap. On the left side the overlap distance is 0, i.e. no overlap. The rods are simply along the main field boundary. On the right side an overlap has been introduced such that the line of rods at the boundary is entirely placed in either of the writing fields and hence will not be stitched across two fields. | Illustration of ''Share between Fields'' overlap. On the left side the overlap distance is 0, i.e. no overlap. The rods are simply divided along the main field boundary. On the right side an overlap has been introduced such that the line of rods at the boundary is entirely placed in either of the writing fields and hence will not be stitched across two fields. | ||
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