Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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''Share between fields:'' This method divides pattern elements at main field boundaries and assigns the entire dose of an element to a single writing field. An overlap region can be defined such that small elements within this overlap are placed in a single writing field to avoid stitching. | ''Share between fields:'' This method divides pattern elements at main field boundaries and assigns the entire dose of an element to a single writing field. An overlap region can be defined such that small elements within this overlap are placed in a single writing field to avoid stitching. | ||
''Split Dose between Fields:'' | ''Split Dose between Fields:'' | ||
''Interleaving:'' | ''Interleaving:'' In this method an interleave is made between writing field boundaries over the distance set by ''Size''. The width of the interleaved strips is set in the ''Element Size Interleaving''. | ||
''Interleaving + extra field:'' | ''Interleaving + extra field:'' This method is somewhat similar to ''Interleave'' but in addition it creates an extra writing field with the interleaving part only. Thus, the interleaving part is written at 50% dose in each of the neighbouring fields and then written at 50% dose in a third (floating) writing field. | ||