Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
| Line 192: | Line 192: | ||
| colspan="2" style="text-align:center;| | | colspan="2" style="text-align:center;| | ||
Illustration of ''Share between Fields'' overlap. On the left side the overlap distance is 0, i.e. no overlap. The rods are simply along the main field boundary. On the right side an overlap has been introduced such that the line of rods at the boundary is entirely placed in either of the writing fields and hence will not be stitched across two fields. | Illustration of ''Share between Fields'' overlap. On the left side the overlap distance is 0, i.e. no overlap. The rods are simply along the main field boundary. On the right side an overlap has been introduced such that the line of rods at the boundary is entirely placed in either of the writing fields and hence will not be stitched across two fields. | ||
|} | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:BEAMER_Split.png|300px]] | |||
|- | |||
| colspan="2" style="text-align:center;| | |||
Illustration of ''Split between fields'' overlap. Over a defined distance at the writing field boundary the geometry is present in both fields but only written with half the dose, as can bee seen by the color of the overlap. | |||
|} | |} | ||