Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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''Overlap Method:'' Allows one to setup a pattern overlap between main fields to mitigate stiching problems. The overlap dimension is controlled with the ''Size'' fields. The methods available are: | |||
''Share between fields:'' | |||
''Split Dose between Fields:'' | |||
''Interleaving:'' | |||
''Interleaving + extra field:'' | |||