Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
Line 179: Line 179:




''Overlap Method:'' Allows one to setup a pattern overlap between main fields to mitigate stiching problems. The overlap dimension is controlled with the ''Size'' fields. The methods available are:
''Share between fields:''
''Split Dose between Fields:''
''Interleaving:''
''Interleaving + extra field:''