Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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''Interactive Resorting of Fields:'' This will allow the user to manually determine the field writing order. | ''Interactive Resorting of Fields:'' This will allow the user to manually determine the field writing order. | ||
'''Important notice:''' The export node will re-fracture the layout with other parameters unless one selects ''Cell To Field'' in the ''Field Ordering'' menu and ''NoCompaction'' in the ''Feature Sorting in Field'' of the export node. | |||
===ChipPlace=== | ===ChipPlace=== | ||