Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
| Line 118: | Line 118: | ||
For precise control of critical dimension (CD) for small features it is important to consider the actual beam size and how it is placed, i.e. how the shapes are filled with beam shots. This is illustrated in the three shapes below. The left shape is 25 x 25 nm and written with a 5 nm beam spot. This works very well. However, if one wishes to write a 28 x 28 nm shape under the same circumstances shot filling becomes an issue. Similarly in the right hand shape, any shape that has a sloped edge will have shot filling issues. It is obvious that these issues are only a concern when CD control on a sub beam size level is needed. | For precise control of critical dimension (CD) for small features it is important to consider the actual beam size and how it is placed, i.e. how the shapes are filled with beam shots. This is illustrated in the three shapes below. The left shape is 25 x 25 nm and written with a 5 nm beam spot. This works very well. However, if one wishes to write a 28 x 28 nm shape under the same circumstances shot filling becomes an issue. Similarly in the right hand shape, any shape that has a sloped edge will have shot filling issues. It is obvious that these issues are only a concern when CD control on a sub beam size level is needed. | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:ShotFilling.png|1000px]] | |||
|- | |||
| colspan="1" style="text-align:center;| | |||
Illustration of shot filling issues for small shapes. | |||
|} | |||
== Bulk and sleeve separation - double current exposure == | == Bulk and sleeve separation - double current exposure == | ||