Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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 ===Export node===
+The export node will export the pattern data to the machine specific format. For exposure on JEOL 9500 export to V30. For exposure on Raith E-line export to Raith EBL File (GDS). Export to V30 has multiple options distributed on the three main panes, ''General'', ''Advanced'' and ''Multipass'', while export to Raith GDS has almost no export options.
+The main options on the ''General'' pane is
+''Machine type:'' Must be set to ''JBX-9500FS (100kV)'', notice it is not the default selection and must be set by the user.
+''Pattern units:'' Unit system of the pattern, should be set to 1 nm.
+''Shot pitch:'' Should be set to 4 units, hence 1 nm. Will be overruled by the SHOT A command in the SDF file.
+''Size:'' Size of the main writing field, maximum size is 1000 x 1000 µm.
+''Fracturing mode:'' This can be used to alter the way Beamer fractures the geometry into trapezoidal shapes. The options in the export module are fairly limited, much more control can be gained by using a ''Fracture'' node.
+''Feature Sorting in Field:'' Can be used to alter the writing order of pattern elements in each writing field. The actual result of these choices can be somewhat hard to predict. After export the result can be seen in the Viewer under ''Tool'' and either ''Show Traversal Path'' or ''Show Writing Order''.