Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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| FDA || Feature Dose Assignment, allows assignment of doses to pattern elements, regions or entire layers | | FDA || Feature Dose Assignment, allows assignment of doses to pattern elements, regions or entire layers | ||
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| Rule-OPC || | | Rule-OPC || Used for rule based process control, for instance offset edges based on pattern dimensions | ||
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| 2D Simulation || | | 2D Simulation || Used to simulate energy distribution (dose) in the resist and resulting dimensions | ||
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| Metrology || | | Metrology || Can be used to measure pattern dimensions, for instance to generate table of dimensions after Shape-PEC | ||
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