Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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! Module/method !! Short description | ! Module/method !! Short description | ||
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| Import || Used to import a layout | |||
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| Export || | |||
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| Edit || | |||
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| Heal || | |||
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| Transform || | |||
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| Bias || | |||
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| AND, OR, MINUS, XOR, P-XOR, NOT || | |||
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| Extract || | |||
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| Replace || | |||
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| Merge || | |||
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| Grid || | |||
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| Mapping || | |||
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| Filter || | |||
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| Fracture || | |||
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| ChipPlace || Graphical interface to set up arrays of patterns and assign dose to each element, excellent for dose testing | |||
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| Visual-Job || | |||
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| PEC || Used to apply Proximity Effect Correction to a pattern | | PEC || Used to apply Proximity Effect Correction to a pattern | ||
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| | | Shape-PEC || | ||
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| 3D-PEC || | |||
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| Corner-PEC || | |||
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| FDA || | |||
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| Rule-OPC || | |||
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| | | 2D Simulation || | ||
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| | | Metrology || | ||
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| | | Split || | ||
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| | | Comment || | ||
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|} | |} | ||
==Node setups== | ==Node setups== | ||