Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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* Thick polymers, glass or quartz samples | * Thick polymers, glass or quartz samples | ||
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* | * Conducting samples | ||
* Semi-conducting samples | |||
* Thin (~ 5 µm <) layers of non-conducting materials such as polymers | |||
* Thick polymers, glass or quartz samples | |||
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* Conducting samples | * Conducting samples | ||
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*Cleanroom of DTU Nanolab in building 346 | *Cleanroom of DTU Nanolab in building 346 | ||
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*Cleanroom of DTU Nanolab | *Cleanroom of DTU Nanolab in building 346 | ||
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*Building 451 - room 913 | *Building 451 - room 913 | ||
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* Secondary electron (Se2) | * Secondary electron (Se2) | ||
* Inlens secondary electron (Inlens) | * Inlens secondary electron (Inlens) | ||
* | * Inlens backscatter electron (Inlens ESB) | ||
* Retractable, column mounted six segment backscatter electron (aBSD) | |||
* Variable pressure secondary electron (VPSE) | * Variable pressure secondary electron (VPSE) | ||
* Retractable, four segment transitted electron (aSTEM) | |||
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* Secondary electron (Everhart-Thornley (ETD)) | * Secondary electron (Everhart-Thornley (ETD)) | ||
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* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | * Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | ||
* Variable at Low vacuum (0.1 mbar-2 mbar) | * Variable at Low vacuum (0.1 mbar-2 mbar) | ||
** Standard VP (variable pressure): 5-60 Pa | |||
** Nano VP, 350 um beamsleeve aperture: 5-150 PA | |||
** Nano VP, 800 um beamsleeve aperture: 5-40 PA | |||
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* Conductor vacuum mode: 5 Pa | * Conductor vacuum mode: 5 Pa | ||
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* All software options available | * All software options available | ||
* Spicer electron magnetic noise cancellations system | |||
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* Antivibration platform | * Antivibration platform | ||
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* Antivibration platform | * Antivibration platform | ||
* | * Spicer electron magnetic noise cancellations system | ||
* Zeiss airlock taking up to 6" wafers | |||
* Plasma cleaner | |||
* Sample bias option | |||
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* Up to 6" wafer with full view | * Up to 6" wafer with full view | ||
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* Up to 8" wafer with 6" view | * Up to 8" wafer with 6" view | ||