Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142: Difference between revisions
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*Nano 1.42 at -19 deg, 5 min | *Nano 1.42 at -19 deg, 5 min | ||
[[File:Etch_rate.png|400px]] | [[File:Etch_rate.png|400px]] | ||
[[File:Test_007.jpg|400px|thumb|Image: Leonid Beliaev]] | [[File:Test_007.jpg|400px|left|thumb|Image: Leonid Beliaev]] | ||