Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
Appearance
| Line 130: | Line 130: | ||
The conclusion to the tests are that the stitching accuracy of the Aligner: Maskless 01 is ±0.1µm. The machine-to-self overlay accuracy is ±0.5µm. The machine-to-machine overlay accuracy could not be determined. | The conclusion to the tests are that the stitching accuracy of the Aligner: Maskless 01 is ±0.1µm. The machine-to-self overlay accuracy is ±0.5µm. The machine-to-machine overlay accuracy could not be determined. | ||
==Important note== | ==Important note about correction options== | ||
You must use all available alignment corrections! | |||
* 2 point alignment can only correct for rotation | |||
* 3+ point alignment can correct for rotation, scaling and shearing - you must use all 3 alignment corrections! | |||
The stage of Aligner: Maskless 01 has suffered some kind of damage (maybe during it's relocation to E-4 in 2019), which means the stage positioning is distorted. When aligning to a pattern exposed using a different machine, we typically see a shearing on the order of 0.1 rad, i.e. the axes are not orthogonal, but even when aligning to patterns exposed on Aligner: Maskless 01 itself, this distortion results in misalignment unless a specific procedure is followed. | The stage of Aligner: Maskless 01 has suffered some kind of damage (maybe during it's relocation to E-4 in 2019), which means the stage positioning is distorted. When aligning to a pattern exposed using a different machine, we typically see a shearing on the order of 0.1 rad, i.e. the axes are not orthogonal, but even when aligning to patterns exposed on Aligner: Maskless 01 itself, this distortion results in misalignment unless a specific procedure is followed. | ||
When aligning on Aligner: Maskless 01, | |||
<br/>If four marks are | When aligning on Aligner: Maskless 01, you should either: | ||
* Use only 2 alignment marks and apply rotation correction | |||
* Use 3+ alignment marks and apply all corrections (rotation, scaling and shearing) | |||
Using only two alignment marks is usually fine for smaller chips, but when exposing full wafers there may be misalignment, especially if previous prints are made on a different machine. With 4 alignment marks and all corrections applied, the best alignment accuracy is obtained for all substrates.<br/> | |||
If four marks are used, but scaling and shearing is not applied, significant misalignment will be observed, even on chips. On a 4" wafer, the shift in Y can be several hundred µm. | |||
==Stitching== | ==Stitching== | ||