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Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano1: Difference between revisions

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New page: {| border="2" cellpadding="2" cellspacing="1" |+ '''The starting point''' |- ! rowspan="6" align="center"| Break | Gas | Cl<sub>2</sub> 20 sccm |- | Pressure | 2 mTorr, Strike 3 secs @ ...
 
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== The first nanoetch recipe ==


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Just as a sanity check, have you got any pre-etch SEM images of the ZEP?  There's a contradiction in the SEM images  - in that you are seeing what looks to be undercut, whilst the trenches are also closing up.  One effect is consistent with too little polymerisation whilst the other is caused by too much.  The breakthrough step is actually quite a physical & directional etch, which usually doesn't cause an undercut.  What exposed area do you have on the samples?
Just as a sanity check, have you got any pre-etch SEM images of the ZEP?  There's a contradiction in the SEM images  - in that you are seeing what looks to be undercut, whilst the trenches are also closing up.  One effect is consistent with too little polymerisation whilst the other is caused by too much.  The breakthrough step is actually quite a physical & directional etch, which usually doesn't cause an undercut.  What exposed area do you have on the samples?
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