Specific Process Knowledge/Lithography/NanoImprintLithography: Difference between revisions
No edit summary |
No edit summary |
||
| Line 5: | Line 5: | ||
==Imprinter 01== | ==Imprinter 01== | ||
[[Image:imprinterfig1.jpg|300x300px|thumb|Imprinter 01: Positioned in cleanroom | [[Image:imprinterfig1.jpg|300x300px|thumb|Imprinter 01: Positioned in cleanroom F-2]] | ||
The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye). | The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye). | ||
| Line 21: | Line 21: | ||
<br clear="all" /> | <br clear="all" /> | ||
====Imprint resist information and flows==== | ====Imprint resist information and process flows==== | ||
*[[Specific Process Knowledge/Imprinting|Imprinting]] | *[[Specific Process Knowledge/Imprinting|Imprinting]] | ||