Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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Finally press “Log result” to produce a text output. Copy and paste the output into a text file and save it with your exposure files, for instance to your M-drive. The procedure must naturally be carried out for all substrates that need alignment exposure. | Finally press “Log result” to produce a text output. Copy and paste the output into a text file and save it with your exposure files, for instance to your M-drive. The procedure must naturally be carried out for all substrates that need alignment exposure. | ||
When you are done with the alignment station, please close the programs, log off the computer and turn the microscope illumination down. Alert a member of the loading team to have your prealigned substrates loaded to the auto stocker. | When you are done with the alignment station, please close the programs, log off the computer and turn the microscope illumination down. Alert a member of the loading team to have your prealigned substrates loaded to the auto stocker. | ||
==System calibration== | |||
Execution if an aligned exposure has the same initial calibration steps as an unaligned exposure, i.e. it has the following steps | |||
*Select and restore the system to the chosen beam current profile ('''RESTOR''') | |||
*Execute a current measurement ('''CURRNT''') | |||
*Execute absorbed electron mark detection ('''INITAE''') | |||
*Execute backscatter electron mark detection ('''INITBE''') | |||
*Execute self calibration routine daily | |||
*Verify drift is low ('''DRIFT''') | |||
*Map height profile of sample ('''HEIMAP''') | |||
After sample height verification follows a few aditional steps to verify the system can find the substrate alignment marks. | |||