Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
| Line 19: | Line 19: | ||
MAGAZIN 'THOPE' | MAGAZIN 'THOPE' | ||
# | #7 | ||
% | %4D | ||
JDF 'thope230126',1 | JDF 'thope230126',1 | ||
ACC 100 | ACC 100 | ||
| Line 29: | Line 29: | ||
HSWITCH OFF,ON | HSWITCH OFF,ON | ||
RESIST 250 | RESIST 250 | ||
SHOT A, | SHOT A,16 | ||
OFFSET(-44,-139) | OFFSET(-44,-139) | ||
END | END 7 | ||
</pre> | </pre> | ||
| Line 55: | Line 55: | ||
P(1) 'thope230126.v30' | P(1) 'thope230126.v30' | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 | ||
STDCUR 6 | STDCUR 6.6 | ||
OBJAPT 5 | |||
END | END | ||
</pre> | </pre> | ||