Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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| [[image:EBLChipAlignExample.png|1200px]] | | [[image:EBLChipAlignExample.png|1200px]] | ||
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| colspan="1" style="text-align: | | colspan="1" style="text-align:left;| | ||
Illustration of chip alignment using a chip array instanced into another array. Notice in the right most illustration how four corner marks are used to force symmetry around (0,0) such that the pattern is placed correctly. | Illustration of chip alignment using a chip array instanced into another array. Notice in the right most illustration how four corner marks are used to force symmetry around (0,0) such that the pattern is placed correctly. | ||
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