Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/OldConfig: Difference between revisions

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 As of December 2020  there is not yet any old configurations.
+=== Publications on the CORE process ===
+; Nguyen, V. T. et al.: On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand
+: 2020 Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 38(4), [043004].
+: https://doi.org/10.1116/6.0000196
+; Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature
+: 2020 ECS J. Solid State Sci. Technol. 9 024002
+: https://doi.org/10.1149/2162-8777/ab61ed
+; Vy Thi Hoang Nguyen et al.: Ultrahigh aspect ratio etching of silicon in SF<sub>6</sub>-O<sub>2</sub> plasma: The clear-oxidize-remove etch (CORE) sequence and chromium mask
+: 2020 Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 38(5), [053002]
+: https://doi.org/10.1116/6.0000357
+; Vy Thi Hoang Nguyen et al.: Cr and CrO<sub>x</sub> etching using SF<sub>6</sub> and O2 plasma
+: 2021 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 39(3), [032201]
+: https://doi.org/10.1116/6.0000922
 === Access to Pegasus 2 configuration templates ===