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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/NewProcessD: Difference between revisions

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Latest revision as of 09:33, 4 September 2025

Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab

Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
15/12-2014 4" Wafer with AZ resist Travka50 pattern Si / 50 % Pegasus/jmli 20 minute TDESC clean nanolab/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes S004743 New showerhead

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