Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope: Difference between revisions
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; Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process | ; Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process | ||
: Microelectronic Engineering Volume 191, 5 May | : 2018 Microelectronic Engineering Volume 191, 5 May, Pages 77-83 | ||
: https://doi.org/10.1016/j.mee.2018.01.034 | : https://doi.org/10.1016/j.mee.2018.01.034 | ||
; Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process | |||
: 2018 J. Micromech. Microeng. 28 105012 | |||
https://doi.org/10.1002/adom.201801176 | : https://doi.org/10.1088/1361-6439/aad0c4 | ||
; Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature | |||
: 2020 ECS J. Solid State Sci. Technol. 9 024002 | |||
: https://doi.org/10.1149/2162-8777/ab61ed | |||
; Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects | |||
: 2019, Advanced Optical Materials Volume 7, Issue 2, pp. 1801176 | |||
: https://doi.org/10.1002/adom.201801176 | |||
; Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures | |||
: 2020, Microelectronic Engineering, Volume 223, 15 February, 111228 | |||
: https://doi.org/10.1016/j.mee.2020.111228 | |||
*[[Media:Grassfree1.pdf | ]] | *[[Media:Grassfree1.pdf | ]] | ||